Class 522 | SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES |
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This Class 522 is considered to be an integral part of Class 520 (see the Class 520 schedule for the position of this Class in schedule hierarchy). This Class retains all pertinent definitions and class lines of Class 520 | ||
SYNTHETIC RESINS (CLASS 520, SUBCLASS 1) |
2 | Processes of forming or modifying a solid polymer by laser; or compositions therefore |
3 | Processes of forming or modifying a solid polymer wherein specified mixing, stirring, agitating, movement of material or directional orientation is employed; or compositions therefore |
4 | Processes of forming or modifying a solid polymer by wave energy wherein at least two distinct external radiant energy sources are utilized; or compositions therefore |
7 | Contains two or more rate-affecting materials, at least one of which is specified |
9 | With a heterocyclic specified rate-affecting material |
10 | With a tertiary amine specified rate-affecting material |
11 | Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitizer |
13 | Specified rate-affecting material is a peroxide or azo compound |
14 | Specified rate-affecting material is an amide or tertiary amine |
15 | Specified rate-affecting material contains onium group |
16 | Specified rate-affecting material is heterocyclic |
17 | Specified rate-affecting material contains sulfur |
18 | Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atom |
19 | Specified rate-affecting material is an aldehyde or aldehyde derivative |
20 | Specified rate-affecting material is a carboxylic acid or derivative |
21 | Specified rate-affecting material contains C-OH or C-O-C group |
22 | Specified rate-affecting material contains an inorganic compound |
23 | Specified rate-affecting material contains only carbon, hydrogen, or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom |
24 | Specified rate-affecting material is a peroxide |
25 | Specified rate-affecting material contains onium group |
26 | Specified rate-affecting material is heterocyclic |
27 | Specified rate-affecting material contains sulfur |
28 | Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen |
29 | Specified rate-affecting material is a metal-containing organic compound |
30 | Specified rate-affecting material is organic |
31 | Specified rate-affecting material contains onium group |
33 | Specified rate-affecting material contains a ketone group -c-(CO)n-c-, the (CO)n not being part of a ring |
34 | Containing ethylenic unsaturation |
35 | Contained in polymeric rate-affecting material, e.g., synthetic resin, etc. |
36 | Containing two or more ketone groups |
38 | Containing phosphorous |
39 | Containing nitrogen |
40 | Containing C-CO-CHOH, e.g., benzoin, etc. |
42 | Containing C-CO-C(R)(OH) wherein R is organic |
43 | Containing C-CO-C(H)(OR) wherein R is organic, e.g., benzoin methyl ether, etc. |
44 | Containing C-CO-C(R)(OR) wherein R is organic, e.g., diethoxyacetophenone, etc. |
45 | Containing halogen, e.g., chloroacetone, etc. |
46 | At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc. |
47 | Specified rate-affecting material is a quinone |
49 | Specified rate-affecting material contains chalcogen other than as oxygen |
50 | Hetero nitrogen ring |
51 | Containing mercapto or mercaptide group, e.g., (thio)mercaptobenzoxazole, etc. |
52 | Containing halogen |
53 | Hetero sulfur ring |
54 | C-(S)*-C wherein * is at least two |
55 | Sulfide |
56 | Mercapto group attached directly to aromatic ring, e.g., thiophenol, etc. |
57 | Nitrogen containing compound |
58 | Sulfenate, e.g., R-O-S-R, etc. |
59 | (O=S=O), e.g., sulfuryl or sulfonyl containing, etc. |
60 | Specified rate-affecting material is a peroxide |
62 | Specified rate-affecting material contains a C-N=N-C-group |
63 | Specified rate-affecting material contains nitrogen or oxygen atom in heterocyclic ring |
64 | Specified rate-affecting material contains phosphorous |
65 | Specified rate-affecting material contains nitrogen |
66 | Specified rate-affecting material contains metal atom |
67 | Specified rate-affecting material contains halogen |
68 | Specified rate-affecting material contains oxygen |
70 | Specified rate-affecting material contains only carbon and hydrogen |
71 | Processes of preparing or treating a solid polymer by wave energy in the presence of a designated nonreactant material (DNRM); or compositions therefore |
72 | Carbohydrate or derivative DNRM |
73 | Coal, asphaltic, or bituminous material DNRM |
74 | Organic DNRM |
75 | Heterocyclic ring containing DNRM |
76 | Phosphorous containing DNRM |
77 | Silicon containing DNRM |
78 | Nitrogen containing DNRM |
79 | Oxygen containing DNRM |
80 | Carbon and hydrogen only containing DNRM |
81 | Heavy metal containing DNRM |
82 | Phosphorous or sulfur containing DNRM |
83 | Oxygen containing DNRM |
87 | Processes involving protein as reactant or as solid polymer; or compositions therefore |
88 | Processes involving carbohydrate as reactant or as solid polymer; or compositions therefore |
90 | Processes involving a polyurethane having terminal ethylenic unsaturation as reactant or as solid polymer; or compositions therefore |
91 | With a polysiloxane reactant or polymer |
92 | With a reactant containing ethylenic unsaturation derived from poly 1,2 epoxide or polymer |
93 | With polycarboxylic acid or derivative and a polyol, a condensate or solid polymer thereof reactant |
94 | With aldehyde or aldehyde derivative reactant, condensate or solid polymer thereof |
95 | With solid polymer derived solely from ethylenic monomers |
96 | With ethylenic reactant |
97 | Polyurethane has an oxygen other than as part of a urethane or carboxylic acid ester group |
98 | Polyurethane has at least one non-terminal ethylenic group |
99 | Processes involving a polysiloxane having ethylenic unsaturation as reactant or as solid polymer; or compositions therefore |
100 | Processes involving an ethylenically unsaturated material derived from poly 1,2-epoxide as reactant or a solid polymer; or compositions thereof |
101 | With polycarboxylic acid or derivative and a polyol, condensate or solid polymer thereof |
102 | With solid polymer derived solely from ethylencally unsaturated monomers |
103 | With ethylenic reactant |
104 | Processes involving an ethylenically unsaturated polyester derived from a polycarboxylic acid or derivative and polyol, condensate or solid polymer thereof; or compositions therefore |
105 | With aldehyde or aldehyde derivative reactant or polymer thereof |
106 | With solid polymer derived from ethylenically unsaturated monomers only |
107 | With ethylenic reactant |
108 | Condensate or solid polymer contains oxygen other than as part of a carboxylic acid ester moiety |
109 | Processes of chemically modifying a blend of two or more solid polymers in the presence of a chemical reactant; or compositions therefore |
111 | Processes of treating a blend of two or more solid polymers or reacting one solid polymer with another solid polymer; or compositions therefore |
113 | Processes of chemically modifying a solid polymer derived only from ethylenically unsaturated monomers by treating polymer with a chemical reactant; or compositions therefore |
114 | Chemical reactant is ethylenically unsaturated |
115 | Phosphorus |
116 | Nitrogen |
118 | Sulfur |
120 | Oxygen |
121 | Chemical reactant has two or more ethylenic groups |
122 | Hetero oxygen |
123 | Contains C-OH group other than as part of a COO-moiety |
124 | Carbon, hydrogen and halogen or carbon and halogen only |
125 | Carbon and hyrogen only |
126 | Chemical reactant contains nitrogen |
127 | Chemical reactant contains sulfur |
129 | Chemical reacant contains oxygen |
131 | Chemical reactant is elemental halogen |
134 | Processes of chemically modifying a solid polymer or SICP derived from at least one saturated monomer by treating solid polymer or SICP with a chemical reactant; or compositions therefor |
135 | Chemical reactant is ethylenically unsaturated |
136 | Nitrogen |
141 | Chalcogen |
142 | Chemical reactant has two or more ethylenic groups |
143 | Hetero oxygen |
144 | Carboxylic acid or derivative |
145 | Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen |
146 | Chemical reactant contains chalcogen |
147 | Chemical reactant contains halogen |
148 | Processes of treating a solid polymer or SICP derived from silicon containing reactant; or compositions therefore |
149 | Processes of treating a reaction product of a solid polymer and ethylenic reactant; or compositions therefore e.g., graft- or graft-type polymer, etc. |
150 | Processes of treating a solid polymer derived from ethylenic monomers only; or compositions therefore |
151 | Solid polymer derived from nitrogen containing monomer |
153 | Solid polymer derived from carboxylic acid or derivative monomer |
155 | Solid polymer derived from halogen containing monomer |
157 | Solid polymer derived from monomer containing only carbon and hydrogen |
162 | Processes of treating a solid polymer or SICP derived from at least one nonethylenic reactant or compositions therefore |
163 | Solid polymer or SICP derived from reactant having halo-C(=O)-halo,halo C(=O)-O, or -O-C(=O)-O-group |
164 | Solid polymer or SICP derived from polycarboxylic acid or derivative and organic amine or from organic amine salt of a polycarboxylic acid |
165 | Solid polymer or SICP derived from polycarboxylic acid or derivative and polyol |
166 | Solid polymer or SICP derived from at least one heterocyclic monomer or aldehyde or aldehyde derivative |
167 | Processes of preparing a solid polymer from heterocyclic nitrogen monomers; or compositions therefore, e.g., carbazole, etc. |
168 | Processes of preparing a solid polymer from a heterocyclic chalogen monomer; or compsitions therefore |
171 | Processes of preparing a solid polymer from at least one phosphorous containing monomer; or compositions therefore |
172 | Processes of preparing a solid polymer from at least one silicon containing monomer; or compositions therefore |
173 | Processes of preparing a solid polymer from at least one nitrogen containing monomer; or compositions therefore |
174 | Nitrogen containing reactant contains a N-C=O or N-C=O moiety |
176 | Organic polyamine and polycarboxylic acid or derivative or from an organic amine salt of a polycarboxylic acid |
177 | Acrylonitrile or methacrylonitrile |
178 | Processes of preparing a solid polymer from at least one oxygen containing monomer; or compositions therefore |
179 | Polycarboxylic acid or derivative and polyol, or condensate thereof, e.g., dimethylterephthalate, etc. |
180 | Sulfur containing |
181 | Ether group |
182 | Carboxylic acid or derivative |
184 | Processes of preparing a solid polymer from ethylenic reactants only; or compositions therefore |
CROSS-REFERENCE ART COLLECTIONS | ||
901 | DARK STORAGE STABILIZER |
902 | AIR INHIBITION |
903 | REMOVAL OF RESIDUAL MONOMER |
904 | MONOMER OR POLYMER CONTAINS INITIATING GROUP |
906 | PREPARING SHRINKABLE MATERIAL |
907 | INVOLVING PRECURSOR OF AN ULTRAVIOLET ABSORBER, E.G., MONOBENZOATE, ETC. |
908 | DENTAL UTILITY |
909 | SOLVENTLESS INK |
910 | TREATMENT THROUGH AN EXTERNAL FILTER OR MASK (NONPHOTOGRAGHIC PROCESS) |
911 | SPECIFIED TREATMENT INVOLVING MEGARAD OR LESS |
913 | NUMERICALLY SPECIFIED DISTINCT WAVELENGTH |
915 | INVOLVING INERT GAS, STEAM, NITROGEN GAS, OR CARBON DIOXIDE |
FOREIGN ART COLLECTIONS | ||
FOR000 | CLASS-RELATED FOREIGN DOCUMENTS |